刻蚀速率R 刻蚀速率 (etch rate) 刻蚀均匀性 (etch uniformity) 选择性S 选择性 (Selectivity) 各项异性度A 各项异性度 (Anisotropy) 掩膜层下刻蚀 (Undercut)
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Etch Rate Uniformity 刻蚀速率均匀性
Is the etch uniformity monitored at least monthly and records maintained as a quality document?
是否至少定期稽核一次蚀刻站并有相应的维护记录作为品质文件？
It is proved that the uniformity of etch rate can be improved and the effect of micro load can be decreased by adjusting the value of chamber pressure, gas flow rate and RF power properly.
结果表明，通过对反应室压力、刻蚀气体流量和射频功率的调节，可以降低微负载效应的影响，得到良好的刻蚀均匀性。
In order to improve the uniformity of the thin film of silicon, the interface of hetero-junction of SOI material was used as the interface of etch self-stopping.
为了提高电容式触觉传感阵列的性能，本工作以SOI材料中异质结界面作为深槽腐蚀中腐蚀自停止界面，以提高硅膜片的表面平整度和厚度均匀性。
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